纳米Ti膜形成过程的扫描隧道显微镜观察  

SCANNING TUNNELING MICROSCOPY OBSERVATION TO FORMATION PROCEDURE OF NANO-Ti FILM

作　　者：谢天生[1] 杜昊[2] 孟祥敏[1] 孙超[2] 闻立时[2] 

机构地区：[1]中国科学院金属研究所固体原子像开放研究实验室,沈阳110016 [2]中国科学院金属研究所,沈阳110016

出　　处：《金属学报》2001年第2期113-117,共5页Acta Metallurgica Sinica

基　　金：国家自然科学基金59895156;国家自然科学基金59830120

摘　　要：用磁控溅射方法在聚合物薄膜基体上制备出不同厚度的纳米 Ｔｉ膜．扫描隧道显微镜（ＳＴＭ）的观察结果表明，初期膜是由直径小于２ｎｍ的形核粒子和粒子团聚体组成．粒子沉积呈岛状生长形成纳米晶粒结构随薄膜厚度增加，平均晶粒尺寸增加，形成大尺寸晶粒的连续薄膜.分析和讨论了薄膜生长过程的结构特征及溅射条件对薄膜结构的影响．Nano-Ti films with different thicknesses were deposited on polymer film substrate by magnetron sputtering. Scanning tunneling microscopy (STM) was used to study the structural characteristic. The results show that the film formed at the initial stage is composed of nuclei particles with diameter less than 2 nm and some particle accumulations. With increasing the sputtering time the deposited particles become island-like and then form Ti film consisted of nano particles. The average grain size increases with increasing thickness of film. The influences of substrate and magnetron sputtering conditions on the film structure were discussed.

关 键 词：磁控溅射 纳米TI膜 扫描隧道显微镜 纳米金属薄膜 

分 类 号：TB383[一般工业技术—材料科学与工程] O484.1[理学—固体物理]