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作 者:王敏涓 黄浩[1] 解川[1] 黄旭[1] 李臻熙[1]
机构地区:[1]北京航空材料研究院先进钛合金航空科技重点实验室,北京100095
出 处:《稀有金属》2014年第3期379-385,共7页Chinese Journal of Rare Metals
基 金:科技部国家重点基础研究发展计划项目(2007CB613803)资助
摘 要:采用磁控溅射物理气相沉积(PVD)法在SiC纤维表面进行Ti3Al涂层的制备,研究了该过程中PVD溅射电流对Ti3Al涂层组织结构的影响规律。通过X射线衍射(XRD)、扫描电子显微镜(SEM)和原子力显微镜(AFM)对Ti3Al涂层的沉积率、组成物相、晶粒大小、组织结构和表面形貌等进行了观察与分析。研究结果表明,磁控溅射PVD法制得的Ti3Al涂层组成物相与靶材一致,但涂层生长择优取向发生了变化。随着溅射电流的增大,Ti3Al涂层沉积率提高,平均晶粒尺寸增大。此外,涂层的微观形貌为柱状晶组织,但随着溅射电流的增加,涂层表面因粒子溅射辐照温度的升高而升温,同时晶粒边界出现迁移,涂层生长由V型柱状晶生长向等轴柱状晶生长转变,最后形成致密组织。涂层粗糙度的变化与涂层晶粒尺寸和微观结构有关,因此Ti3Al涂层表面粗糙度随着溅射电流增加呈现出先增大后减小的规律。Ti3Al coating was produced on the surface of SiC fiber by magnetron sputtering physical vapor deposition method, and the effect of sputtering current on the growth mechanism and microstructure of Ti3Al coating was investigated. The deposition rate, compo- sition phase, crystal size, microstructure and surface morphology of the physical vapor deposition(PVD) Ti3Al coating were systemati- cally studied using X-ray diffraction (XRD), scanning electron microscope (SEM) and atomic force microscope (AFM). The results indicated that the phase of PVD coating was in accord with the target but the preferred orientation was altered. During PVD processing, the deposition rate of Ti3Al coating and average crystal size raised with sputtering current increasing. In addition, all coatings appeared columnar, however, coating growth mechanism was transformed with the improvement of the sputtering current, i. e. , from V-shaped columnar to equiaxed columnar, finally formed dense tissue, which could be attributed to the grain boundary migration and the elevated surface temperature brought by radiation. Meanwhile, the coating surface toughness was closely related to crystal size and microstruc- ture, thus the surface roughness of coatings increased at first then decreased gradually with the increase of sputtering current.
分 类 号:TB333[一般工业技术—材料科学与工程]
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