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作 者:蔡宏中[1,2] 易健宏[1] 胡昌义[1,2] 常桥稳[2] 魏燕[2] 郑旭[2] 刘伟平[2] 陈力[1,2]
机构地区:[1]昆明理工大学,云南昆明650093 [2]昆明贵金属研究所稀贵金属综合利用新技术国家重点实验室,云南昆明650106
出 处:《稀有金属材料与工程》2014年第5期1254-1257,共4页Rare Metal Materials and Engineering
基 金:云南省高层次科技人才培引工程资助项目(2009CI019)
摘 要:以二氯化钯和2,2,6,6-四甲基-3,5-庚二酮为原料,在甲醇中合成了一种新的β二酮前驱体-双(2,2,6,6-四甲基-3,5-庚二酮酸)钯(Ⅱ)。通过元素分析、红外光谱、核磁共振氢谱及单晶X射线衍射等技术对合成的前驱体进行了结构表征。热重-差热分析表明,在N2气氛中,当温度升到291℃时,前驱体基本挥发完全。采用合成的前驱体通过金属有机化学气相沉积(MOCVD)技术在石英上沉积制备钯薄膜,利用XRD和AFM分析手段对薄膜的结构和表面形貌进行了表征。结果表明,所得到的薄膜纯净,无其他杂质存在,薄膜表面连续、致密。A new precursor, bis(2,2,6,6-tetramethyl-3,5-heptanedionato)paUadium was synthesized from PdCI2 and Hthd in methanol. Thestructure of bis(2,2,6,6-tetramethyl-3,5-heptanedionato)palladium was characterized by element analysis, infrared spectroscopy, ~HNMRspectroscopy and single crystal XRD analysis. Thermal decomposition properties were studied by thermogravimetric analysis undernitrogen atmosphere. The results show that bis(2,2,6,6-tetramethyl-3,5-heptanedionato)palladium is an ideal precursor for it is completelyvolatiled at 291 ℃. The palladium films were prepared from the synthesized precursor by metal organic chemical vapor deposition(MOCVD) on quartz. The structure and morphology of palladium films were studied by XRD and AFM, respectively. The results indicatethat the pure palladium films are successfully prepared and the surface of films is continuous and compact.
关 键 词:双(2 2 6 6-四甲基-3 5-庚二酮酸)钯(Ⅱ) 钯薄膜 MOCVD
分 类 号:TB383.2[一般工业技术—材料科学与工程]
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