高纯W-Si合金粉的研制  

Preparation of High Purity W-Si Alloy Powder

作　　者：丁照崇[1,2] 陈明[1,2] 刘书芹[1,2] 王欣平[1,2] 吕保国[1,2] 

机构地区：[1]北京有色金属研究总院,北京100088 [2]有研亿金新材料股份有限公司,北京102200

出　　处：《稀有金属材料与工程》2014年第5期1269-1271,共3页Rare Metal Materials and Engineering

摘　　要：以高纯W粉、Si粉为原料,在真空环境下进行高温预合金化处理,制备了高纯W-Si合金粉。通过优化,确定了最佳预合金化温度为1000℃;合金粉中,单质W相消失,生成WSi2相。粉末粒度呈单峰分布,d50为21.037μm,d90为50.905μm,纯度可达到99.995%以上。采用合金粉烧结的磁控溅射靶材的微观组织、成分均匀分布,解决了W-Si靶材成分难以均匀的难题。In order to prepare high purity tungsten silicide （W-Si） alloy powder, high purity W powder and Si powder as starting materialswere pre-alloyed in high temperature and vacuum environment. The pre-alloying temperature was 800, 1000 and 1200 ℃, and theoptimized temperature was 1000 ℃. Through the pre-alloying of 1000 ℃, the W phase disappeared and the WSi2 phase formed in thepowder. The powder particles present single peak distribution and the particle size of ds0 is 21.037μm, and d90 is 50.905 μm. And thepowder purity could reach more than 99.995%. Using the pre-alloying tungsten silicide powder as material, the magnetron sputteringtarget was sintered with a uniform microstructure and alloy composition, which solve the problem of non-uniform microstructure and alloycomposition of tungsten silicide target.

关 键 词：高纯W-Si 预合金化 磁控溅射靶材 

分 类 号：TF123.71[冶金工程—粉末冶金]