基于凸投影算法的多相位掩模设计原理研究  

Study on Design Principle of Multi-phase-shifting Mask Based on Convex Projection Algorithm

作　　者：罗先刚[1] 姚汉民[1] 冯伯儒[1] 陈旭南[1] 周崇喜[1] 李展[1] 张远红[2] 

机构地区：[1]中国科学院光电技术研究所微细加工光学技术国家重点实验室,成都610209 [2]成都电子科技大学计算机学院,成都610057

出　　处：《微细加工技术》2001年第1期8-13,共6页Microfabrication Technology

基　　金：微细加工光学技术国家实验室基金;国家自然科学基金资助项目(69876041)

摘　　要：根据所需光刻图形的分布 ,反推掩模结构的思路 ,提出了一种基于交替投影算法的掩模设计方法。该方法设计出的掩模为振幅和相位连续。并给出了一个设计实例和量化方法。实验结果表明该方法对复杂相移掩模的设计有效 ,可以减小邻近效应。The idea of deducing the construction of the mask according to the distribution of the desired IC patterns is put forward.A new method based on alternative projection operation to devise phaseshifting mask has been proposed. The amplitudes and phases of the devised mask are continuous.An example mask and the quantification method are given.The experiment results show that the method is effective to devise complex phase?shifting masks and the proximity effect is decreased.

关 键 词：相移掩模 凸投影 多相位 

分 类 号：TN305.7[电子电信—物理电子学]