磁控射频溅射法制备光波导薄膜研究  

Study of the Glass Thin-film Optical Waveguides Deposited by the Reaction Magnetron Sputtering

作　　者：胡雪涛[1] 李佐宜[1] 林更琪[1] 王浩敏[1] 廖红伟[1] 

机构地区：[1]华中科技大学电子科学与技术系,武汉430074

出　　处：《光电子技术与信息》2001年第1期27-29,34,共4页Optoelectronic Technology & Information

摘　　要：采用磁控射频溅射法制备了用作光波导器件的玻璃薄膜。通过选取不同的溅射材料，在不同溅射条件下制备的玻璃薄膜的光学参数进行的测量、比较，并对其作为光波导的性能进行研究，通过理论上推导与计算，得出了在１，５５ｕｍ窗口下制备光波导器件的玻璃薄膜所应具备的溅射条件。In this paper, the glass thin film waveguides is deposited by the reaction magnetron sputtering' We measure and compare the optical parameter of glass thin film made by different sputtering material under different conditions. We research the waveguides capa- bility of the thin film. We educe the condition which should be provided with to deposit waveguides glass thin film in the window of 1.55 um.

关 键 词：玻璃薄膜 磁控溅射 光波导 

分 类 号：TN25[电子电信—物理电子学]