离子氮化技术的研究进展  

Research Progress in Plasma Nitriding

作　　者：李杨[1] 王亮[2] 

机构地区：[1]烟台大学环境与材料工程学院,烟台264005 [2]大连海事大学交通运输装备与海洋工程学院,大连116026

出　　处：《材料导报》2014年第13期61-64,共4页Materials Reports

基　　金：国家自然科学基金(51301149;51179017)

摘　　要：离子氮化具有工件变形小、渗速快、节能环保等优点,能有效提高金属零部件的表面硬度、耐磨损和耐腐蚀等性能。然而受气体放电特性和电场效应的影响,工件形状对表面温度的均匀性影响很大,出现表面打弧、边缘效应和空心阴极效应等问题。为了克服传统直流离子渗氮的缺点,近年来出现了一些射频离子氮化、等离子体浸没离子注入、活性屏渗氮以及空心阴极氮化等新技术。Plasma nitriding offers many advantages such as small deformation, fast nitriding, energy saving and environmental protection,it can improve the surface hardness, wear resistance and corrosion resistance of the metal parts effectively. However, under the gas discharge characteristics and the electric field effect, it was found that the workpiece shape affect uniformity of surface temperature. Conventional plasma nitriding has some inherent shortco- mings, such as damage caused to parts by arcing, the ＂edging effect＂, ＂hollow cathode effect＂. To overcome these common problems associated with conventional plasma nitriding, many methods including RF plasma nitriding, plasma immersion ion implantation, active screen plasma nitriding and hollow cathode discharge nitriding have been developed in the past few years.

关 键 词：离子渗氮 活性屏渗氮 等离子体浸没离子注入 空心阴极放电 

分 类 号：TG156.8[金属学及工艺—热处理]