磁场在晶体生长中的应用  

Review on Magnetic Field Applied in Crystal Growth

作　　者：狄晨莹 左然[1] 苏文佳[1] 

机构地区：[1]江苏大学能源与动力学院

出　　处：《材料导报》2014年第13期72-77,共6页Materials Reports

基　　金：国家自然科学基金青年基金(51206069);高等学校博士学科点专项科研基金(20123227120017);江苏省自然科学青年基金(BK2012295);江苏大学高级专业人才启动基金(1281130015)

摘　　要：针对磁场在晶体生长中的应用,综述了近年来该领域数值模拟和实验研究的进展,包括静态磁场和动态磁场的产生原理及其在晶体生长中的效应。分析了晶体生长过程中存在的主要流动。综述了晶体生长过程中磁场力对导电熔体对流、固液界面形貌和杂质分布的影响,重点分析了磁场在直拉法单晶硅和定向凝固法多晶硅生长过程中的应用,总结了该领域当前存在的问题及其发展趋势。Based on the current studies mainly involved in the principle of a static magnetic field and a non-static magnetic field and the effects of a magnetic field in crystal growth, the development of the researches on the numerical study and experimental results on the magnetic field applications is reviewed. In crystal growth, the main flow in the melt is analyzed, the effects of force induced by a magnetic field on melt flow, growth interface shape and solute distri- bution of the conducting melt are discussed. The magnetic field applied in Czochralski mono-silicon and directional so- lidification multicrystalline silicon crystal growth is analyzed particularly. The existing problem nowadays and the de- velopment trends in this field are pointed out.

关 键 词：静态磁场 动态磁场 晶体生长 熔体对流 单晶硅 多晶硅 

分 类 号：TG249.6[金属学及工艺—铸造]