硬质薄膜耐磨性的凹坑磨损法  

Dimple-Grinding Method to Evaluate Hard Films' Antiwear Properties

作　　者：虞晓江[1] 李戈扬[1] 吴桢干[1] 竺品芳[1] 

机构地区：[1]上海交通大学金属基复合材料国家重点实验室,上海200030

出　　处：《实验室研究与探索》2001年第1期37-38,42,共3页Research and Exploration In Laboratory

基　　金：金属基复合材料国家重点实验室开放基金项目

摘　　要：薄膜镀层由于厚度小 ,难以用通常的磨损方法评估其耐磨性。本文研究了采用精密凹坑研磨仪评价薄膜镀层耐磨性的方法 ,并对 Ta N/ Nb N纳米多层膜和 Ta N、Nb N单层膜进行了磨损实验。结果表明 ,精密凹坑研磨仪是一种适用于评价薄膜镀层耐磨性的方法。Ta N/ Nb N纳米多层膜有比 Ta N、TbThe antiwear properties of thin film coatings are difficult to be evaluated by ordinary method because the coatings are too thin in thickness. A precise dimple grinding method was introduced and discussed and the antiwear properties of TaN/NbN nano multilayer film, TaN and NbN single layer films were evaluated by this new method. The results show that the precise dimple grinding method is a proper method to evaluate the antiwear properties of thin film coatings. TaN/NbN nano multilayer film shows a better antiwear property than TaN and NbN single layers.

关 键 词：硬质薄膜 耐磨性 精密凹坑研磨仪 TaN/NbN纳米多层膜 

分 类 号：O484.43[理学—固体物理] TG76[理学—物理]