非晶含氟聚合物薄膜的热稳定性  

THERMAL STABILITY OF AMORPHOUS FLUOROPOLYMER FILMS

作　　者：丁士进[1] 王鹏飞[1] 张剑云[1] 张卫[1] 王季陶[2] 张冶文[3] 夏钟福[3] 

机构地区：[1]复旦大学 [2]复旦大学电子工程系,上海市200433 [3]同济大学

出　　处：《材料研究学报》2001年第2期201-204,共4页Chinese Journal of Materials Research

基　　金：国家自然科学基金资助项目69776026

摘　　要：以Ｔｅｆｌｏｎ ＡＦ １６００为原料，用旋涂法制备了非晶含氟聚合物（ＡＦ）薄膜．通过扫描电镜（ＳＥＭ）、傅立叶转换红外（ＦＴＩＲ）光谱和Ｘ射线光电子（ＸＰＳ）光谱等手段对热退火前后的薄膜进行了表征所得薄膜具有无针孔，较光滑和平整的表面，３００℃退火后薄膜表面的均匀性进一步改善。ＡＦ薄膜在３００℃以下具有良好的热稳定性，在４００℃退火后ＣＦ３吸收峰强度稍有降低。在４００Ｃ退火后，其所含的ＣＦ３键合构型显著降低，ＣＦ２、ＣＦ等其它构型没有明显的变化，由于ＣＦ３基团的分解有少量无定型碳生成．Amorphous fluoropolymer films were prepared by using Teflon AF 1600 as raw material and spin-on method. The films were characterized by scan electric mirror (SEM), Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectrum (XPS). SEM photographs show that the obtained films have no-pinhole and relative smooth and flat surfaces, and the uniformity of the film is improved further after annealing at 300°C. According to FTIR spectra of the films heated at different temperatures, it can be found that AF film has excellent thermal stability below 300°C, and for the film heated at 400°C the intensity of CF3 adsorption peak decreases slightly. XPS indicates that CF3 bonding configurations in AF film annealed at 400°C decrease remarkably and CF2, CF etc. bonding configurations do not show obvious changes. Meanwhile, a little amorphous carbon may be formed due to decomposition of CF3 groups.

关 键 词：旋涂法 热稳定性 非晶含氟聚合物薄膜 退火 热处理 

分 类 号：O484.4[理学—固体物理] O631.31[理学—物理]