金刚石薄膜的快速沉积及成膜研究  

Rapid Growth of Diamond Films

作　　者：阎震[1] 李荣志[1] 朱鹤孙 

机构地区：[1]北京理工大学化工系

出　　处：《化工学报》1991年第5期611-616,共6页CIESC Journal

基　　金：国家863新材料专家组资助

摘　　要：本文采用直流电弧等离子体喷射法制备金刚石薄膜,对其进行了拉曼光谱及扫描电镜分析.并介绍了几种实验中常见的晶形.最后对金刚石的形成过程作了初步探讨.A DC arc plasma jet apparatus was established to prepare diamond film with good quality. High deposition rate of 65 μm/h was achieved on non-polished molybdenum substrate, and diamond films can be deposited in an area as large as 10-20mm in diameter. The diamond films were analyzed by Raman spectrum and SEM. Raman results showed only a peak at 1334cm-1, which fitted well with that of natural diamond. SEM results showed that diamond crystal grew well and the film was dense and uniform. Several forms of diamond crystal in our research were presented. Finally, a preliminary discussion on the formation of diamond film was made.

关 键 词：金刚石薄膜 沉积 成膜 

分 类 号：TN304.18[电子电信—物理电子学]