大气光化学烟雾反应机理比较(Ⅱ)HO_x和光化学氧化产物的比较  

A COMPARISON OF ATMOSPHERIC PHOTOCHEMICAL MECHANISMS(Ⅱ) HO_x AND PHOTOCHEMICAL PRODUCTS

作　　者：刘峻峰[1] 李金龙[1] 白郁华[1] 

机构地区：[1]北京大学技术物理系,北京100871

出　　处：《环境化学》2001年第4期313-319,共7页Environmental Chemistry

摘　　要：在相同初始和排放条件下,对四种应用较广的光化学烟雾反应机理(ＣＢ４－９９,ＲＡＤＭ２,ＭＣＭ,ＳＡＰＲＣ９９)进行了６组方案的比较．比较物种包括:(１)ＯＨ和 ＨＯ２自由基;(２)Ｈ２Ｏ２,ＨＮＯ３,ＰＡＮ,甲醛和有机硝酸酯等光化学产物;(３)甲苯和ＳＯ２;(４)ＮＯｙ,ＮＯａ和ＮＯｚ．由于各机理对ＶＯＣＳ、自由基及含氮化合物处理的不同,导致了模拟结果存在较大差异．我们用模式模拟这些物种时,应特别注意机理不同而带来的模拟结果差异．A comparison of four atmospheric photochemical mechanisms (e.g. CB4-99, RACM, RADM2, SAPRC99) was conducted by using the same initial values and emission data. Eight species (including: (1) OH and HO2 radicals, (2) H2O2, HNO3, PAN, formaldehyde and or-ganic nitrate, (3) toluene and SO2, (4) NOy NOa and NOz) were studied. Due to the different methods of lumping VOCs and treating radicals among the four mechanisms, significant differences of the prediction were found. Therefore, for selecting mechanisms in simulating of these species it should be paid more attention to the difference of photochemical mechanisms.

关 键 词：光化学反应机理 HOX 光化学氧化产物 大气污染 光化学污染 光化学烟雾 

分 类 号：X131.1[环境科学与工程—环境科学]