ZnS头罩增透保护膜系制备  

ANTIREFLECTIVE AND PROTECTIVE FILMS PREPARATION ON ZnS DOME

作　　者：宋建全[1] 刘正堂[1] 于忠奇[1] 耿东生[1] 郑修麟[1] 

机构地区：[1]西北工业大学材料科学与工程学院,陕西西安710072

出　　处：《红外与毫米波学报》2001年第3期203-206,共4页Journal of Infrared and Millimeter Waves

基　　金：国防"九五"预研基金 (编号 J12 .2 .8)资助项目;陕西省自然科学基金 (编号 99C2 9)资助项目&&

摘　　要：利用计算机对不同运动轨迹下 Zn S头罩外表面膜厚分布进行了模拟 ,优化出头罩的最佳运动轨迹 ,在该轨轨迹下采用射频磁控反应溅射 (RRFS)法进行头罩镀膜 ,能够得到满足使用要求的薄膜厚度均匀性 .实验结果表明 ,头罩外表面薄膜厚度不均匀性小于 10 % ,双面镀膜后 ,8～ 11.5 μm波段平均透过率从 6 9.6 %提高到 87.2 %以上 ,透过率的不均匀性小于 1.2 % ,满足了红外应用中对 Zn S头罩的要求 .Antireflective and protective films consisted of GexC1-x films were prepared by reactive radio frequency magnetron sputtering (RRFS) on ZnS dome. A computer was used to simulate the thickness distribution of the film of ZnS dome for different movement tracks, and the best one was got by using the best dome movement track. The thickness uniformity of films could meet the application requirement when films were deposited by RRFS on the dome. The computer control system was built according to the simulation results, and antireflective and protective films consisted of GexC1-x films were deposited on the ZnS dummy dome. The results show that 1) the variation of thickness is lower than 10%, 2) the average transmittance, in the 8 similar to 11. 5 mum waveband, is raised from 69.6% to above 87.2% after the films are coated on double sides, 3) the average transmittance variation is less than 1.2%. Thus the requirements of ZnS dome in infrared application are met.

关 键 词：头罩 射频磁控溅射 厚度均匀性 红外光学性能 模拟 增透保护膜系 硫化锌 薄膜 

分 类 号：O484.41[理学—固体物理]