高反射硅镜弱吸收的研究  

Study of Weak Absorption of the Thin Films Coated on the Si Plates

作　　者：王英剑[1] 胡海洋[1] 李庆国[1] 范正修[1] 

机构地区：[1]中国科学院上海光机所,上海201800

出　　处：《中国激光》2001年第10期937-940,共4页Chinese Journal of Lasers

基　　金：国家"8 6 3 410"计划资助项目

摘　　要：运用表面热透镜技术精确测量 1315nm高反射硅镜的弱吸收 ,并结合原子力显微镜所显示的薄膜表面情况判断引起吸收的原因 。In order to reduce the absorption and loss in the process of coating thin films, the weak absorption of the thin films coated on the Si plates at 1315 nm and their surface feature were measured by using surface thermal lensing method and atomic force microscopy, respectively. The schematic depiction of the surface thermal lensing method and its experimental arrangement were given. The basic feature of the measured samples and the data of calibration sample and the measured samples were also listed. The factors that induce absorption are briefly discussed.

关 键 词：表面热透镜 原子力显微镜 弱吸收 高反射硅镜 

分 类 号：TH742[机械工程—光学工程]