掺氮对类金刚石薄膜场发射的影响  

THE EFFECT OF NITROGEN ADDITION ON FIELD EMISSION OF DIAMOND-LIKE CARBON FILMS

作　　者：马会中[1] 张兰[1] 姚宁[2] 李运均[2] 毕兆琪[2] 王小平[3] 张兵临[2] 胡欢陵[4] 

机构地区：[1]郑州工业大学数理系,郑州450002 [2]郑州大学物理工程学院,郑州450052 [3]郑州航空管理学院,郑州450005 [4]中国科学院安徽光学精密机械研究所,合肥230031

出　　处：《电子与信息学报》2001年第11期1246-1248,共3页Journal of Electronics & Information Technology

基　　金：863计划新材料领域资助项目

摘　　要：利用脉冲激光沉积技术制备出了掺氮和未掺氮的类金刚石薄膜。采用X射线衍射仪、喇曼光谱仪、扫描电镜观察了掺氮和未掺氮类金刚石薄膜的微结构和表面形貌。场发射实验表明,掺氮降低了类金刚石薄膜的阈值电场,提高了发射电流密度。The Diamond-Like Carbon (DLC) film and Nitrogen-doped DLC(N-DLC) film are deposited on molybdenum coated ceramic substrate by using the pulsed laser deposition technique. The microstructure and morphology of the films are examined using X-ray diffraction, Raman spectroscopy and scanning electron microscopy. Field emission measurements are carried out by using the diode structure. The field emission measurements indicate that nitrogen doping can lower the turn-on field and increase the current density.

关 键 词：类金刚石薄膜 场发射 掺氮 

分 类 号：TN304.055[电子电信—物理电子学] TN304.18