水热条件下Cu_2O的连生习性  

Epitaxial Growth Habit of Cu_2O under Hydrothermal Condition

作　　者：陈之战[1] 施尔畏[1] 李汶军[1] 郑燕青[1] 仲维卓[1] 

机构地区：[1]中国科学院上海硅酸盐研究所,上海201800

出　　处：《人工晶体学报》2001年第4期369-374,共6页Journal of Synthetic Crystals

基　　金：国家自然科学基金重点资助项目 (No .5 9832 0 80 )

摘　　要：Cu2 O具有立方体、八面体、菱形十二面体、四角三八面体、三角三八面体等多种单形。其形貌特征因不同的制备方法而各异。本文首次发现在水热条件下 ,Cu2 O出现取向连生的形貌特征。{ 10 0 }面为连生面。The morphology of Cu 2O was different according to various preparation methods.The epitaxial growth habit was firstly found when Cu 2O was synthesized under hydrothermal route used Cu(CH 3COO) 2 as precursor.The epitaxial face was {100}.This phenomenon was reasonably explained on the basis of the incorporation of growth units of anionic coordinated polyhedra model.

关 键 词：氧化亚铜 连生现象 负离子配位多面体 生长基元 水热条件 CU2O 晶体习性 

分 类 号：O781[理学—晶体学] O614.121