褶合光谱法作抗脱氧核糖核酸突变药物筛选的初步研究  

Screening of Anti-mutation Medicine by Convolution Spectrometry

作　　者：陆峰[1] 张晓芳[1] 刘荔荔[1] 武向锋[1] 吴玉田[1] 

机构地区：[1]第二军医大学药学院,上海200433

出　　处：《分析化学》2001年第11期1325-1328,共4页Chinese Journal of Analytical Chemistry

摘　　要：采用褶合光谱法考察紫外线致脱氧核糖核酸 (DNA)突变 ,并以褶合光谱差谱值δ的形式量化地表达DNA细微突变的程度 ,其灵敏度远高于二阶导数光谱法。DNA中添加二甲亚砜后表现的褶合光谱差谱变化与高效毛细管电泳指纹图谱的结果一致。褶合光谱法分析过程简单快速 ,可以用于抗紫外线损伤。Convolution spectrometry (CS) is applied to determine the deoxyribonucleic acid (DNA) mutation induced by ultraviolet (UV) radiation, and the extension of miniature mutation is quantitatively expressed by the differential value (δ) of CS. Second derivative spectrometry (DS) seems no variation when δ gets up to 5.8% on CS, representing the higher sensitivity of CS than DS. The addition of dimethylsulfoxide (DMSO) to DNA changes the δ in different way at different wavelengths. DMSO decreases the δ value at wavelength of 365 nm as anti mutation protector dose, and increases the δ value at 254 nm as mutation inducer dose, which coincides well with the result from capillary electrophoresis and the previous essay. It takes less than 1 minute for analytical procedure from absorption spectra to CS δ. The fast, easy and economic CS can serve as a screening tool for anti UV, anti mutation medicine.

关 键 词：褶合光谱法 抗紫外线损伤药物 药物筛选 DNA 脱氧核糖核酸 紫外线 损伤 突变 抗突变药物 

分 类 号：O657.3[理学—分析化学]