金刚石膜和氢化非晶碳膜电阻率测量的对比研究  

Comparion Research of Measurement of Resistansity for Diamond Film and a-C:H Film

作　　者：胡颖[1] 徐力[1] 高著秀[1] 

机构地区：[1]首都师范大学物理系

出　　处：《首都师范大学学报（自然科学版）》2001年第4期20-22,30,共4页Journal of Capital Normal University：Natural Science Edition

基　　金：北京市自然科学基金资助项目 2 982 0 11

摘　　要：对金刚石膜和氢化非晶碳膜的电阻率测试方法进行了对比研究 .即对金刚石膜采用“大”尺度电极 ,氢化非晶碳膜采用“大”尺度电极和小尺度电极测量I-V曲线进行对比分析和讨论 。The measure method of resistansity of diamond film and a-C:H film are compared in this work. Large criterion electrode is applied to diamond film and both large and small criterion electrodes are applied to a-C:H film. The result of measurement of I-U curve is studied and discussed and significant outcome is derived.

关 键 词：金刚石膜 氢化非晶碳膜 电极测量 电阻率 金属-半导体-金属结构 电学性能 I-V特性曲线 

分 类 号：O484.42[理学—固体物理] TM934.16[理学—物理]