Mo_2C膜表面粗糙度随温度和时间变化规律的研究  

Temperature and Time Dependence of Interface Roughness for Mo_2C Thin Film

作　　者：章娴君[1] 王显祥[1] 罗玲[1] 郑瑞伦[2] 

机构地区：[1]西南师范大学化学化工学院,重庆400715 [2]西南师范大学物理系,重庆400715

出　　处：《西南师范大学学报（自然科学版）》2002年第1期64-68,共5页Journal of Southwest China Normal University(Natural Science Edition)

基　　金：教育部科技攻关资助项目 9710 2

摘　　要：对以羰基金属气相沉积制备的Mo2 C膜表面粗糙度进行了测量 ;在测量基础上进行统计 ,找出了表面高度分布并确定表面粗糙度随时间和温度的变化规律 .结果表明 :Mo2 C膜表面粗糙化属快速粗糙化 ,粗糙度随时间的变化具有标度函数的特征 ;The preparation of Mo\-2C thin film by metal organic chemical deposition(MOCVD)and experimental data on interface roughness are provided; the distribution of interface height is given on basis of measured data; and the variation of the interface roughness with time and temperature is determined. The results show that the rule of roughening for Mo\-2C interface is rapid roughening; the variation of the interface foughness with time obeys scaling law; and the interface roughness increases with the rise of substrate temperature.

关 键 词：MO2C膜 高度分布 表面粗糙度 温度 时间 变化规律 

分 类 号：O484.1[理学—固体物理]