Instability of Epitaxially Strained Thin Films Based on Nonlocal Elasticity  

作　　者：Wang-Min Zhou Wang-Jun Li 周旺民;李望君(College of Mechanical Engineering, Zhejiang University of Technology)

机构地区：[1]College of Mechanical Engineering, Zhejiang University of Technology

出　　处：《Chinese Physics Letters》2019年第1期44-47,共4页中国物理快报（英文版）

基　　金：Supported by the Zhejiang Provincial Natural Science Foundation of China under Grant Nos LY18A020011 and LQ17A020001;the National Natural Science Foundation of China under Grant No 11702247

摘　　要：We perform a linear analysis of the elastic fields and stability of epitaxially strained thin films based on nonlocal elasticity. We derive expressions of perturbed stresses to the first order of perturbation amplitude, which show that the stresses are directly proportional to the lattice mismatch and the perturbation amplitude, and decrease with an increase in the perturbation wavelength. The critical perturbation wavelength distinguishes whether the flat film for the perturbation is stable, which is inversely proportional to the square of the mismatch and decreases with the thickness of the film.We perform a linear analysis of the elastic fields and stability of epitaxially strained thin films based on nonlocal elasticity. We derive expressions of perturbed stresses to the first order of perturbation amplitude, which show that the stresses are directly proportional to the lattice mismatch and the perturbation amplitude, and decrease with an increase in the perturbation wavelength. The critical perturbation wavelength distinguishes whether the flat film for the perturbation is stable, which is inversely proportional to the square of the mismatch and decreases with the thickness of the film.

关 键 词：NONLOCAL ELASTICITY EPITAXIAL strain film THIN Films 

分 类 号：O4[理学—物理]