磁过滤的阴极弧等离子体源及其薄膜制备  

Filtered Cathodic Arc Plasma Source and Thin Film Deposition

作　　者：张涛[1] 侯君达[1] 刘志国[1] 张一聪[2] 

机构地区：[1]北京师范大学低能核物理研究所,北京100875 [2]北京市辐射中心,北京100875

出　　处：《中国表面工程》2002年第2期11-15,20,共6页China Surface Engineering

基　　金："十五""863"项目(2001AA338020-3);北京自然科学基金(1002005);北京科技新星计划(952870400)

摘　　要：采用磁过滤弯管滤除阴极弧等离子体中的大颗粒,研究了偏压和导向磁场对磁过滤弯管传输效率的影响。建立了磁过滤弯管中正交电场和磁场下的等离子体扩散模型,分析各个参数对等离子体传输的作用规律。采用磁过滤的阴极弧等离子体源制备了NbN膜,研究了沉积温度对膜层特性的影响。The magnetic filter was used to avoid macro-particles in cathodic arc plasma. The effects of bias and magnetic field on the transportation efficiency of the filter was investigated. A model of plasma diffusion in electric and magnetic field was proposed. The effect of parameters on the transportation of plasma was discussed as well. A NbN film was deposited by the filtered cathodic arc plasma source. It was found that a good quality film can be obtained when substrate temperature is higher than 500 ℃.

关 键 词：阴极弧等离子体 扩散 薄膜 磁过滤 

分 类 号：O462.5[理学—电子物理学] O485[理学—物理]