复杂微光刻图形版图设计系统  

A Layout Design System for Complex Microfabrication Graphs

作　　者：胡勇[1] 黄广宇[1] 陈宝钦[1] 李友[1] 

机构地区：[1]中科院微电子中心微光刻光掩模实验室,北京100029

出　　处：《微细加工技术》2002年第2期15-18,23,共5页Microfabrication Technology

摘　　要：介绍了一种自主开发的复杂微光刻图形版图绘制系统。该系统能根据用户的要求自动成组地批处理各种圆环、螺旋线、椭圆环、扇形、条形码等图形 ,以及根据用户输入的任意表达式来生成特殊形状图形 ,同时它具有方便的图形形态处理功能 ,包括图形任意角度的旋转、旋转拷贝功能 ;重叠图形和回字图形挖空并加辅助线功能 ;位图格式图形轮廓化处理功能及图形切割、切块功能等。该系统极大地提高了目前集成电路版图设计工具软件绘图功能 ,使其更能适用于微电子、微光学、微机电系统等微光刻领域的复杂图形设计 ,是一种实用性很强的软件模块。A layout design system for complex microfabrication graphs is introduced.According to the user's requirements the system can automatically and in batches generate various graphs,such as torus,spires,ellipses,arcs and bar codes etc,and special graphs based on the user's input expressions.It has easy graphs processing functions,including the graphs rotation in arbitrary angle,rotation copy,cutting and auxiliary line addition,contouring of bit pattern formatted graphs and graphs dividing etc..This system greatly improves the graphs design ability of current EDA tools and make them to be able to draw complex graphs in microelectronics,micro-optics and MEMS (Micro Electromechanical Systems).It is a very useful software module for EDA tools.

关 键 词：微光刻图形 版图设计系统 图形变换 

分 类 号：TN305.7[电子电信—物理电子学]