Important Works About Rules in Rules-Based Optical Proximity Correction  

基于规则的光学邻近矫正中规则的相关处理(英文)

作　　者：石蕊[1] 蔡懿慈[1] 洪先龙[1] 吴为民[1] 杨长旗[1] 

机构地区：[1]清华大学计算机科学与技术系,北京100084

出　　处：《Journal of Semiconductors》2002年第7期701-706,共6页半导体学报（英文版）

摘　　要：Considering the efficiency and veracity of rules based optical proximity correction (OPC),the importance of rules in rules based OPC is pointed out.And how to select,to construct and to apply more concise and practical rules base is disscussed.Based on those ideas,four primary rules are suggested.Some data resulted in rules base are shown in table.The patterns on wafer are clearly improved by applying these rules to correct mask.OPCL,the automatic construction of the rules base is an important part of the whole rules based OPC system.讨论了如何选择适当的规则 ,如何建立简洁实用的规则库 ,如何应用规则库 .提出了四种主要的光学邻近矫正规则 ,在实验结果中列举了规则库中的部分数据 .利用规则矫正后的版图光刻得到的硅片图形有了明显的改善 .规则库的自动建立部分 (OPCL)是基于规则的光学邻近矫正系统的重要组成部分 .

关 键 词：optical lithography optical proximity correction rules  base 

分 类 号：TN405.97[电子电信—微电子学与固体电子学]