采用外接恒流源对注入机进行剂量校准  

Dose Calibration of lon lmplanter with External Current Source

作　　者：谢一强[1] 李红征[1] 

机构地区：[1]信息产业部电子第五十八研究所,无锡214035

出　　处：《微电子技术》2002年第3期54-56,共3页Microelectronic Technology

摘　　要：本文作者采用KEITHLEY 2 2 0型可编程电流源对半导体生产中的关键工艺设备EATONNV6 2 0 0A进行剂量校准 ,确保离子注入设备的精确计量。本文对于测试原理及校准过程作了详细论述。目前这一监控手段已用于实际生产 。The author makes use of KEITHLEY 220 to perform the dose calibration for EATON NV6200A ion implanter,which is the key equipment in semiconductor production.The theory and process of the dose calibration with external current source are discussed in the paper in details,and it has been used in semiconductor manufacturing.

关 键 词：剂量 束流 区域 束流放大器 BCA 

分 类 号：TN407[电子电信—微电子学与固体电子学]