基于溶胶凝胶法的纳米磨料抛光工具基体特性研究(英文)  

Characteristic Study on Matrix of Nano-Sized Abrasive Polishing Tool Fabricated by Sol-Gel Technique

作　　者：宋运运[1,2] 陆静[1,2] 徐西鹏[1,2] 

机构地区：[1]华侨大学机电及自动化学院,厦门361021 [2]华侨大学脆性材料加工技术教育部工程研究中心,厦门361021

出　　处：《纳米技术与精密工程》2014年第4期286-292,共7页Nanotechnology and Precision Engineering

基　　金：国家自然科学基金资助项目(U1034006;51105149);福建省高校杰出青年科研人才培育计划资助项目(JA13006)

摘　　要：相对于传统化学机械抛光(CMP)技术存在的磨料浪费和抛光液污染环境等问题,一种以海藻酸钠(SA)水凝胶为基体的纳米磨料抛光工具开始展现其潜在的应用前景和环保优势.为了解决凝胶干燥成膜过程中基体严重收缩导致的磨料层很薄以及储存过程中基体继续失水引起的工具表面干裂失效等问题,采用了向基体中添加干燥控制化学添加剂(DCCA)的方法;并通过正交实验和极差分析,分析了不同DCCA对基体收缩的影响程度,选择了最佳的添加剂浓度配比.最后通过硅片抛光试验,对改良后的工具加工性能进行了检验.试验结果表明,向基体中添加质量分数为4%的纳米二氧化硅、12%的蔗糖和0.14%的十二烷基硫酸钠(SDS)对基体收缩的抑制效果最明显,磨料层的厚度提高了1.7倍,且在储存过程中不再出现明显的脱水失效.同时,该工具的基体变成了疏松多孔的结构,进而提高了工具的加工性能.Considering the abrasive waste and environment pollution in commercial chemical mechanicalpolishing （CMP）, a newly developed polishing tool fabricated by fixing nano-sized abrasives in sodiumalginate （SA） solgel shows great application potential. But the shrinkage of the matrix not only makesabrasive layer thinner when drying, but also produces cracks on tool surface because of continuous waterloss during storage. To solve the above problems, some drying control chemical additives （DCCA） wereadded into the matrix. The impact of DCCA on the matrix shringkage was analyzed and the optimum ratiosof DCCA in the matrix were obtained by orthogonal experiment and extremum difference analysis. Siliconwafers were polished for testing polishing performance of the modified tool. The results indicate that thebest contents （mass fraction） of the additives are 4% nano-silica, 12% sucrose and 0. 14% sodium do-decyl sulfate （SDS） for inhibiting tool shrinkage. The thickness of the abrasive layer is increased by 1.7times, and there are no obvious cracks on the tool surface during storage. Meanwhile, the gel matrix be-comes a loose porous structure which can improve the polishing performance of the tool.

关 键 词：化学机械抛光 纳米磨料 海藻酸钠 溶胶凝胶 干燥控制化学添加剂(DCCA) 正交实验 抛光 

分 类 号：TG175[金属学及工艺—金属表面处理]