TiAlN涂层制备过程中Ti,Al元素存在形式的演变分析  

Evolution Analysis of Existing Forms of Ti and Al Elements during Preparation of TiAlN Coating

作　　者：梁俊才 周武平[1,2,3] 张凤戈[1,2,3] 穆健刚[1,2,3] 赵海波[4] 

机构地区：[1]钢铁研究总院,北京100081 [2]安泰科技股份有限公司,北京100081 [3]北京市镀膜靶材重点实验室,北京100081 [4]四川大学分析测试中心,四川成都610064

出　　处：《稀有金属》2014年第4期561-566,共6页Chinese Journal of Rare Metals

基　　金：国家自然科学基金项目(51275323);国家科技部科技重大专项项目(2012ZX04003011)资助

摘　　要：采用目前商用原子比为Ti50Al50的合金靶材,利用磁控溅射工艺,在硬质合金基体上沉积TiAl和TiAlN涂层。借助扫描电镜(SEM),X射线衍射仪(XRD)对Ti,Al元素在靶材和涂层中的存在形式作了分析,利用洛氏硬度试验机和纳米硬度仪对涂层的结合强度和硬度等力学性能做了测试分析。结果表明:Ti,Al元素在TiAl合金靶材中以纯Ti相和纯Al相存在,其中Ti原子颗粒镶嵌在Al原子的基体中;在TiAl涂层中以纯Ti单质相和Ti3Al合金相存在;在TiAlN涂层中以面心立方TiN相和密排六方AlN相存在。在涂层的制备过程中,靶材的溅射阶段属于靶材金属离子的产生过程,Ti,Al两种元素由靶材中双单质相结构转变为具有一定能量的离子流状态;涂层的沉积阶段属于Ti,Al两种元素的重新结合状态,无反应气体参与情况下形成合金化结构,反应气体的参与下Ti原子与N原子结合成TiN相,Al以置换TiN晶格中的Ti原子存在。Ti,Al元素的氮化作用导致涂层力学性能发生了变化,涂层硬度由12.8 GPa提高到23.5 GPa;涂层的结合强度由HF-1变为HF-2,均具有较好的结合强度。TiAl and TiAlN coatings were deposited on cemented carbide with commercial Ti50Al50 alloy target by magnetron sputtering technology. The existing forms of Ti and Al elements were studied by scanning electron microscopy （SEM） and X-ray diffraction （XRD）, the adhesive strength and hardness were measured by nano indentation and adhesion testing. The results showed that Ti and AI dual-phase existed in TiA1 target, and Ti grains were embedded into the A1 matrix; single-phase Ti and binary-phase Ti3 Al alloy were found in TiAI coating ; cubic TiN and hexagon AlN phases existed in TiAlN coating. In the preparation of TiAl coating and TiAlN coating, the sputtering process belonged to the generation of target metal ions, and the existing forms of Ti and Al elements changed from the dual-phase to the metal ions with certain energy. The deposition process belonged to the recombination of Ti and Al elements, with the formation of alloy phase without reactive gas and formation of TiN and AlN with the function of nitrogen gas. Al atoms substituted Ti atoms in TiN based phase and AlN phase formed, which could improve the mechanical properties of the coatings. The adhesive strength of the coating changed from HF-1 to HF-2, resulting in better adhesive strength.

关 键 词：TiAl靶材 TIALN涂层 磁控溅射 相结构 力学性能 

分 类 号：TB716[一般工业技术—真空技术] TB741