冲击片雷管爆炸箔的制备与电爆性能  

Preparation and Electrical Performance of Exploding Foil in Slapper Detonator

作　　者：黄娜[1] 唐洪佩 黄寅生[1] 何义[1] 

机构地区：[1]南京理工大学化工学院,江苏南京210094 [2]广东宏大爆破股份有限公司,广东广州510623

出　　处：《含能材料》2014年第4期514-520,共7页Chinese Journal of Energetic Materials

基　　金：国防预研基金(51305100202)

摘　　要：为了提高爆炸箔起爆系统的能量利用率,采用闭合场非平衡磁控溅射离子镀技术和皮秒激光微加工系统,制备了Cu、C u/Au、C u/Al/Ni三种爆炸箔,并利用自制起爆回路对其电爆性能进行了研究,结果表明,在充电电压为2000,2500 V时,C u爆炸箔在电爆过程中能量利用率较高;在此电压下对三种爆炸箔的性能进行了对比测试,得到在相同的充电电压下Cu/Al/Ni、Cu/Au、C u爆炸箔的爆发电流C u/Al/Ni>C u/Au>C u,且充电电压为2500 V时C u/Al/Ni爆发电流比C u增长了36%,2000 V下比C u增长了15%;在充电电压2500 V时利用高速摄影法对三种爆炸箔电爆时产生的等离子体羽进行了观测,结果表明,等离子体羽的尺寸Cu/Al/Ni>Cu/Au>Cu。In order to improve energy utilization ratio of initiation system, three kinds of exploding foils Cu, Cu/Au and Cu/AI/Ni were prepared by the closed-field unbalanced magnetron sputtering iron plating technology and pico-second laser micromachining system. And their electro explosive performances were studied by designed test circuit. It is found when charging voltage are 2000 V or 2500 V, initiation voltage can match with Cu exploding foil in high energy utilization rate. And the electrical explosion performances in three kinds of exploding foils were also tested at 2000 V and 2500 V. which indicates that Cu/AI/Ni burst current is much higher than the Cu/Au and Cu with an increase of 36% compared with Cu at charging voltage of 2500 V, and 15% compared with Cu at 2000 V. The plasma plumes generated during the explosion in three kinds of exploding foils were observed by high-speed photography when the charging voltage is 2500 V. Results show that the size of the plasma plumes Cu/AI/Ni〉 Cu/Au〉Cu. Finally, Cu/AI/Ni exploding foil is more conducive to low energy exploding foil initiator systems under the same initi- ating condition.

关 键 词：军事化学与烟火技术 冲击片雷管 磁控溅射 激光微加工 电爆性能 

分 类 号：TQ560.1[化学工程—炸药化工]