AZ31镁合金表面磁控溅射Al和TiN的试验研究  

Research on surface properties of Al and TiN films deposited on AZ31magnesium alloys by magnetron sputtering

作　　者：沈钰[1,2] 祝向荣[3] 

机构地区：[1]中国科学院嘉兴轻合金技术工程中心,浙江嘉兴314006 [2]中国科学院上海微系统与信息技术研究所,上海200050 [3]上海第二工业大学,上海201209

出　　处：《轻合金加工技术》2014年第8期56-61,66,共7页Light Alloy Fabrication Technology

摘　　要：采用直流磁控溅射在AZ31镁合金表面分别沉积了Al膜和TiN膜。对这两种膜的表面特性进行了研究和比较。扫描电子显微镜(SEM)观察到沉积态样品的膜层是致密的。两种膜的样品在200℃温度下保温30 min热处理后,SEM观察到膜层仍旧是致密的,没有裂纹等缺陷产生。表面附着性试验表明,沉积态的膜层和镁合金基底间具有很好的附着性。纳米压痕测试结果表明,Al膜层表面和TiN膜层表面的显微硬度平均值分别为1.897 HV和23.85 HV,两者差一个数量级,TiN呈现硬质膜层的特性。还进行了模拟体液腐蚀膜层的试验,结果表明Al膜层在模拟体液中的耐腐蚀特性优于TiN膜层的。A1 films and TiN films were separately deposited on the AZ 31 magnesium alloy substrates by DC magnetron sputtering technique. The surface properties of the samples were investigated and compared. The scanning electronic microscope （SEM） observations revealed the dense structure characteristics of as-deposited A1 films and TiN films. After heat treatment at 200℃ for 30 minutes, the films＇ structure is still dense, and no structural defects such as cracks were observed on the surface of A1 films or TiN films. Adhesion experiments demonstrate the strong combination between the as-deposited films and the magnesium alloy substrates. Nano-indentation measurements show that the average micro-hardness of A1 films and TiN films reach 1. 897 HV and 23.85 HV, respectively. TiN films are one order of magnitude harder than A1 films. Finally, the corrosion experiments in the simulated body fluid initially indicate different corrosion properties of A1 films and TiN films. A1 films present more effective anti-corrosion than TiN films.

关 键 词：镁合金 磁控溅射 Al膜 TIN膜 表面特性 

分 类 号：TG174.4[金属学及工艺—金属表面处理]