Stability for a novel low-pH alkaline slurry during the copper chemical mechanical planarization  

作　　者：陈国栋 刘玉岭 王辰伟 刘伟娟 蒋勐婷 袁浩博 

机构地区：[1]Institute of Microelectronics, Hebei University of Technology

出　　处：《Journal of Semiconductors》2014年第8期171-176,共6页半导体学报（英文版）

基　　金：Project supported by the Special Project Items NO.2 in National Long-Term Technology Development Plan,China(No.2009ZX02308);the Hebei Natural Science Foundation of China(No.F2012202094)

摘　　要：： The stability of a novel low-pH alkaline slurry （marked as slurry A, pH = 8.5） for copper chemical mechanical planarization was investigated in this paper. First of all, the stability mechanism of the alkaline slurry was studied. Then many parameters have been tested for researching the stability of the slurry through comparing with a traditional alkaline slurry （marked as slurry B, pH = 9.5）, such as the pH value, particle size and zeta potential. Apart from this, the stability of the copper removal rate, dishing, erosion and surface roughness were also studied. All the results show that the stability of the novel low-pH alkaline slurry is better than the traditional alkaline slurry. The working-life of the novel low-pH alkaline slurry reaches 48 h.The stability of a novel low-pH alkaline slurry （marked as slurry A, pH = 8.5） for copper chemical mechanical planarization was investigated in this paper. First of all, the stability mechanism of the alkaline slurry was studied. Then many parameters have been tested for researching the stability of the slurry through comparing with a traditional alkaline slurry （marked as slurry B, pH = 9.5）, such as the pH value, particle size and zeta potential. Apart from this, the stability of the copper removal rate, dishing, erosion and surface roughness were also studied. All the results show that the stability of the novel low-pH alkaline slurry is better than the traditional alkaline slurry. The working-life of the novel low-pH alkaline slurry reaches 48 h.

关 键 词：STABILITY LOW-PH alkaline slurry copper multilevel CMP 

分 类 号：TN305.2[电子电信—物理电子学]