纳米压印用压印胶的研究进展  

Research Progress of Resists for the Nanoimprint Lithography

作　　者：董会杰[1] 辛忠[2] 陆馨[2] 

机构地区：[1]武汉纺织大学化学与化工学院,武汉430200 [2]华东理工大学化学工程联合国家重点实验室,上海200237

出　　处：《微纳电子技术》2014年第10期666-672,共7页Micronanoelectronic Technology

基　　金：上海市科委纳米技术专项资助项目(0652nm001)

摘　　要：纳米压印需采用压印胶进行图案转移,作为压印技术的关键材料,压印胶的性能直接影响到纳米压印的质量。根据压印技术的工艺特点对压印胶进行了分类,介绍了纳米压印用热压印胶和紫外压印胶的发展研究现状和性能优缺点,分析了目前压印胶存在的主要问题,并指出压印胶的研究主要是提高压印胶的脱模性能、固化速率以及简化工艺,主要列举了含氟硅类压印胶、双表面能压印胶的性能特点,并展望了未来的发展方向。Resists are used to transfer patterns in the nanoimprint lithography.As the key materials for the nanoimprint lithography,the properties of resists have directly influence on the quality of the nanoimprint lithography.According to the features of the nanoimprint lithography,the resists are classified,the development research status and performance advantages and disadvantages of thermal and UV-curable nanoimprint lithography resists are introduced.The current main problems of the resists are analyzed,and it is pointed out that the research of the resists is mainly improving the demoulding property,curing rate and simplifying the process.The performance characteristics of fluorine and silicon containing resists and bi-surface property resists are mainly listed and analyzed.Finally,the development direction of resists is prospected.

关 键 词：纳米压印 紫外压印胶 热压印胶 脱模性 表面能 

分 类 号：TN305.7[电子电信—物理电子学]