光栅刻划刀架系统的运行精度对光栅光谱性能的影响  

Influence of running accuracy of ruling carriage system on grating spectrum performance

作　　者：杨超[1,2] 于海利[1] 冯树龙[1] 李晓天[1] 齐向东[1] 姜珊[1,2] 唐玉国[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所,吉林长春130033 [2]中国科学院大学,北京100049

出　　处：《光学精密工程》2014年第10期2674-2682,共9页Optics and Precision Engineering

基　　金：国家自然科学基金资助项目(No.60478034);国家创新方法工作专项资助项目(No.2008IM040700);国家重大科研装备研制项目(No.ZDY2008-1);国家重大科学仪器设备开发专项资助项目(No.11YQ120023);吉林省重大科技攻关项目(No.09ZDGG005);国家973项目资助(No.2014CB049500)

摘　　要：采用菲涅耳-基尔霍夫衍射理论建立了存在刻线弯曲和刻线位置误差的光栅衍射谱成像数学模型,分析了上述误差对光栅光谱性能的影响。针对刻划刀架系统运行不稳定问题,设计了一套光学测量结构,并提出了刻划刀架系统的机械改进方案:采用双侧柔性铰链式结构代替原有的鞍型滑块与刻划刀架的固定连接方式。最后,进行了刻划刀架系统运行稳定性测试和光栅刻划实验。刻划刀架运行稳定性测试实验表明:改进后的刻划刀架系统运行稳定性比改进前有显著改善,位移曲线重复性误差PV值由127nm降低到13nm,降低了约89%。光栅刻划实验表明,刻划刀架系统改进后,光栅光谱性能有明显的改善,光栅杂散光得到了有效抑制。得到的实验结果与仿真分析结果较为一致,为提高机械刻划光栅质量提供了理论及技术保障。A grating diffractive spectral imaging model with ruling line bend and ruling line position er- rors was established based on the Fresnel-Kirchhoff diffraction theory, and the effect of these errors mentioned above on grating spectral properties was analyzed. For the instability of ruling carriage sys- tem, an optical measuring system was designed, and a mechanical improvement for the ruling carriage system was proposed. It was implemented by adopting a bilateral flexible hinge structure to replace the fixed linking method of original saddle slider pattern and ruling carriage system. Finally, The experi- ments on the stability test of ruling carriage system and the grating ruling test were performed. Theexperiment on the stability test of ruling carriage system shows that running stability of the improved score tool holder system is improved significantly as compared to that before improvement, and the dis- placement curve repeatability error （PV value） has reduced from 127 nm to 13 nm, decreased about 89 %. Moreover, the grating ruling experiment shows that the grating spectrum performance after im- proving ruling carriage system has improved greatly, and the stray light has been effectively sup- pressed. These results obtained are in agreement with that of simulation, and provides theory and technological bases for improving grating ruling quality.

关 键 词：刻划刀架 刻划光栅 刻线弯曲 刻线位置误差 光栅光谱 

分 类 号：O436.1[机械工程—光学工程] TN305.7[理学—光学]