碳酸钠制备单晶硅绒面的研究  

Preparation of texturing monocrystalline silicon with sodium carbonate solution

作　　者：刘德雄[1,2] 李晓红[1] 李文秀[1] 

机构地区：[1]西南科技大学新能源技术与应用研究所,四川绵阳621010 [2]中国科学技术大学国家微尺度物质科学实验室,安徽合肥230026

出　　处：《江苏大学学报（自然科学版）》2014年第6期705-709,共5页Journal of Jiangsu University：Natural Science Edition

基　　金：国家自然科学基金青年基金资助项目(11204250);西南科技大学青年基金资助项目(12zx3102)

摘　　要：为了提高单晶硅太阳电池的光电转换效率,采用了一种新型无毒碳酸钠强碱盐溶液对单晶硅表面进行腐蚀,制备类似金字塔绒面,降低硅片表面的反射率增加光谱吸收,研究溶液的质量分数、制绒时间,以及碳酸氢钠的质量分数对制绒效果的影响.研究结果表明：质量分数为13.0%的Na2CO3溶液在95℃下23 min时制备的绒面反射率最低.向Na2CO3溶液中添加Na HCO3制备出的绒面反射率更低,在400~800 nm光谱范围平均反射率可达11.150%,而且绒面上的金字塔体积更小,分布更均匀.比较传统的碱与醇的混合液,碳酸钠溶液制绒过程中无需添加异丙醇（IPA）,无毒无污染,成本更低廉.In order to improve the optoelectronic conversion efficiency of monocrystalline silicon solar cells,a new nontoxic alkaline etchant of Na2CO3 was used to texture single crystalline silicon wafers,reduce surface reflectivity of silicon wafer and enhance light absorption.The effects of etchant concentration,texturing time and additive concentration on texturization effect were investigated.The results show that the lowest texturization reflectivity was obtained with 13.0% Na2CO3 solution at 95 ℃ for 23 minutes.Adding Na HCO3 into Na2CO3solution,the reflectivity can be further decreased,and the average reflectance reaches 11.150% at the range of 400 nm to 800 nm with more little and homogeneous pyramids on silicon surface.Compared with conventional solution of Na OH and IPA,Na2CO3 solutions are introduced to etch silicon wafers with lower cost,and the large-scale production of single crystalline silicon solar can be promised by the proposed method.

关 键 词：单晶硅 碳酸钠 各向异性刻蚀 金字塔 反射率 

分 类 号：TK514[动力工程及工程热物理—热能工程]