LPVCD的原理与故障分析  

The Principle and Fault Analysis of LPCVD

作　　者：张士伟[1] 

机构地区：[1]中国电子科技集团公司第十三研究所,河北石家庄050051

出　　处：《电子工业专用设备》2014年第5期15-18,共4页Equipment for Electronic Products Manufacturing

摘　　要：文中介绍了CVD工艺的种类和特点。以LPVCD为例,介绍了其工艺的基本原理,以及设备的基本结构。根据多年的设备维护经验,分析了LPCVD设备的常见问题,提出了处理措施。最后,总结出了LPCVD设备的工艺维护方法。This paper introduces the types and characteristics of CVD process. In LPCVD, for example, this paper introduces the basic principle of the process, as well as the basic structure of the equipment. According to the years of experience in equipment maintenance, analysis the common problems of LPCVD equipment, processing measures are put forward. Finally, LPCVD equipment technology maintenance methods were summarized.

关 键 词：化学气相淀积 低压化学气相沉积 故障分析 工艺维护 

分 类 号：TN304.055[电子电信—物理电子学]