液态源可控蒸发输送系统  

Controlled Evaporation Mixing Liquid Delivery System

作　　者：吴得轶 杨彬[1] 

机构地区：[1]中国电子科技集团公司第四十八研究所,湖南长沙410111

出　　处：《电子工业专用设备》2014年第8期28-30,58,共4页Equipment for Electronic Products Manufacturing

摘　　要：在太阳能电池、微电子等半导体工艺制程中,液态源以生产效率高、成膜特性好、气压小不易泄漏等优点,广泛应用于扩散、氧化、化学气相沉积等工艺。如:在太阳能电池PN结制程中,掺杂用的液态磷源、液态硼源,以及在湿氧氧化工艺中使用的蒸馏水;在光电子、微电子行业中,化学气相淀积设备(CVD)使用的HMDSO、TEOS、SiHCl3等。实验数据显示,这些液态源的输送对各种掺杂、氧化、淀积工艺的质量具有很大影响。对液态源输送的技术现状进行阐述,分析了现有技术的特性和缺点,并结合未来工艺对装备要求的趋势,在此基础上提出了一种液态源可控蒸发输送系统。In semiconductor technology process like that of solar cell and micro-electronics, liquid source, due to its advantages of high productivity, favorable film-coating feature, low gas pressure and rare leakage, is widely applied for processes such as diffusion, oxidation and various chemical vapor deposition. For instance, there are doped liquid phosphorous source and liquid boron source used for making solar cell PN junction and distilled water for wet oxidation, as well as HMDSO, TEOS and SiHCI3 etc. for various chemical vapor deposition （CVD） equipment in photoelectron and micro-electronics industries. Massive laboratory data has proved that those liquid sources exert significant influence on doping, oxidation, deposition and other various processes. Based on explaining current liquid source delivery technology and analyzing its features and shortcomings, and following the tendency of process requirements for equipment in the future, the paper proposed an evaporation controllable liquid source delivery system.

关 键 词：液态源输送 扩散炉 氧化炉 化学气相淀积 

分 类 号：TM615[电气工程—电力系统及自动化]