采用EB-PVD技术在TiAl基体上沉积NiAlHf涂层的研究(英文)  

NiAlHf Coating on TiAl Substrate Prepared by EB-PVD

作　　者：张东博[1] 宋冠禹 薛志勇[1] 贾龙[1] 徐钢[1,2] 

机构地区：[1]华北电力大学电站设备状态检测与控制教育部重点实验室,北京102206 [2]重庆大学低品位能源利用技术及系统教育部重点实验室,重庆400044

出　　处：《稀有金属材料与工程》2014年第11期2657-2662,共6页Rare Metal Materials and Engineering

基　　金：Fundamental Research Funds for the Central Universities(12MS11);Program for New Century Excellent Talents in University(NCET-12-0849);National Basic Research Program of China(2011CB710706);the Open Fund of Key Laboratory of Low-grade Energy Utilization Technologies and Systems of Ministry of Education(KH3381)

摘　　要：采用电子束物理气相沉积(EB-PVD)技术在Ti Al基体上制备Ni Al Hf涂层,结合氧化增重曲线的测试结果,研究了Ni Al Hf涂层对基体在900,950和1000o C空气中氧化行为的影响。采用X-射线衍射(XRD)研究表面的物相结构,XRD结果表明,沉积后表面形成β-Ni Al相,说明Hf固溶于其中。结果表明,在950o C氧化后涂层表面形成致密的氧化铝保护膜。扫描电子显微镜(SEM)和能谱(EDS)被用来测试其表面的形貌和元素分布。结果表明,在氧化过程中,基体和涂层之间的元素发生互扩散。随着氧化时间的增加,涂层厚度减小,扩散区发生显著变化。采用显微硬度表征涂层的韧性,涂层的显微硬度(HV)为7050 MPa左右。Ni Al Hf涂层能提高基体高温抗氧化性能。In order to improve the oxidation resistance of TiAL substrate at high temperatures, NiA1Hf coating was prepared by elec- tron beam physical vapor deposition （EB-PVD） on the TiAI substrate. According to the measured mass gain curves, the effect of NiAIHf coating on the oxidation behavior of TiAl substrate was studied at 900, 950 and 1000 ℃. X-ray diffraction （XRD） was em- ployed to identify the phases of the surfaces at different states. The XRD results show that β-NiAl is formed after deposition and element Hf is found to be dissolved into it. A dense Al2O3 protection film is formed on the coating surface after 950 ℃ oxidation. Scanning electron morphology （SEM） with energy dispersive spectrum （EDS） was employed to characterize the morphology and element distribution at the cross-section and the surface. During oxidation, elements diffusion occurs at the interface between the substrate and the coating. With increasing of oxidation duration, the thickness of the coating decreases and the diffusion zone changes rapidly. Micro-hardness was used to characterize the coating toughness. Its micro-hardness is about HV7050 MPa. The re- sults show that NiA1Hf coating can improve the substrate oxidation resistance at high temperatures.

关 键 词：电子束物理气相沉积 TiAl基体 NiAlHf涂层 氧化 

分 类 号：TG178[金属学及工艺—金属表面处理]