碳材料表面沉积硅化物的研究  

Study on Silicide Coating Formed on the Carbon Material Surface

作　　者：唐建新[1,2] 高军[1] 王重海[2] 张铭霞[2] 杜斌[2] 李传山[2] 

机构地区：[1]山东理工大学,淄博255049 [2]山东工业陶瓷研究设计院有限公司,淄博255031

出　　处：《现代技术陶瓷》2014年第6期13-19,共7页Advanced Ceramics

摘　　要：采用化学液相沉积工艺(RCLD),在碳材料表面快速附着一层结合紧密、致密均匀的硅化物涂层,研究了不同直径的预制体表面处理以及电压和电流等对碳材料外部硅化物层结构和性能的影响。结果表明,经王水腐蚀的石墨表面粗糙化,有利于沉积层的生成和附着;预制体的直径为7mm、电压为52V、电流为60A时的抗氧化沉积层具有较好的性能。In this paper, a combination of close and coMPact silicide coating on the carbon material was formed by Rapid Chemical Liquid--phrase Deposition process （RCLD） . The effect of different diameter of preform, different voltage and current, holding time etal on the structure and perform- ance for the silicide layer of carbon materials has been researched. The result showed that, the graph- ite was rusted by aqua regia appeared surface roughness, which is conducive to the formation of sedi- ment and adhesion. The antioxidative sediments has good performance with a 7 mm diameter , volt- age of 52 V and current of 60A.

关 键 词：碳材料 涂层 化学液相沉积 硅化物 

分 类 号：TQ127.2[化学工程—无机化工]