大面积光刻胶线棒涂布工艺研究  

Study on Bar Coating Process for Large-Area Photoresist Coating

作　　者：韦必明 金名亮 吴昊[1] 窦盈莹 周国富[1] 水玲玲[1] 

机构地区：[1]华南师范大学华南先进光电子研究院,彩色动态电子纸显示技术研究所,广州510006

出　　处：《华南师范大学学报（自然科学版）》2015年第2期84-89,共6页Journal of South China Normal University(Natural Science Edition)

基　　金：国家自然科学基金项目(21303060);广东省自然科学基金项目(S2013010014418);教育部引进创新科研团队项目(IRT13064);广东省创新科研团队项目(2011D039)

摘　　要：介绍了一种在大面积基材上涂布高粘度光刻胶的线棒涂布法.主要针对涂膜厚度与均匀性进行研究,结果表明,膜厚随着光刻胶粘度和涂布棒尺寸的增大而变厚,涂布速度在某一范围内对膜厚无影响.线棒涂布机设备中所加垫板的硬度直接影响涂膜的均匀性,硬度小的垫板可获得更均匀的涂膜,而垫板高度在某一范围内对膜厚无影响.与常用旋涂法相比,线棒涂布法具有操作简单、节省材料和可大面积涂布等优点.A direct bar coating process of high viscosity photoresist on large-area substrate for micro manufacturing is reported in this paper. The influence of coating parameters on the thickness and uniformity of the film layer was investigated. It is shown that the film thickness increases with an increase in the viscosity of the polymer and the size of the coating bars. We have proposed and verified a method to improve the film homogeneity based on inserting a supporting substrate under the coating substrate. We found that more homogenous film can be obtained by using softer supporting materials rather than hard supporting materials,and the film thickness is basically not change with the coating speed in a wide range of coating speed by using softer supporting materials. Compared with spincoating,bar-coating is a method for simple,fast,materials saving,suitable for large substrates coating.

关 键 词：线棒涂布法 大面积涂布 高粘度 光刻胶 涂布工艺 

分 类 号：TQ586.3[化学工程—精细化工]