Cu(Ni80 Cr20)-陶瓷复合机体的激光刻蚀机制  

Laser Ablation Mechanism of Cu( Ni_(80)Cr_(20))- Ceramic Composite Body

作　　者：韦波[1] 王瑞[1] 吴敢[1] 杨建平[1] 

机构地区：[1]兰州空间技术物理研究所/真空技术与物理重点实验室,兰州730000

出　　处：《宇航材料工艺》2015年第1期53-56,共4页Aerospace Materials & Technology

摘　　要：为解决陶瓷基底金属薄膜一体化部件的激光微加工精度问题,研究了纳秒脉冲激光作用于Cu(Ni80Cr20)-Al2O3复合机体的薄膜/基底界面分离机制。结果表明:激光刻蚀Cu时,光斑扫过的区域的Cu能够完全气化,得到较光滑的图案;在刻蚀Ni80Cr20时,光斑扫过的区域首先被氮化,随后氮化层剥离,导致刻蚀图形边沿粗糙。激光光斑能量呈高斯分布,使得Ni80Cr20氮化程度不均匀,是影响刻蚀精度的主要原因。利用波前衍射变换技术将光斑能量由高斯分布转换为能量呈平顶分布,在激光能量大于5.4 m J时,厚度4μm的Ni80Cr20层均匀氮化剥离,实现了Ni80Cr20-Al2O3组合体高精度、基底无损伤刻蚀。To solve the ceramic substrate metal film-integrated component of laser micro-machining accuracy problems,under atmospheric environment, nanosecond pulsed laser effects, of the Cu （ Ni80 Cr20 ） -Al2O3 composite body were studied experimentally of film/substrate on interface separation mechanism. The results show that ： when la- ser ablation Cu, laser spot effected region can be completely gasified to give a more smooth image, but when ablation the Ni80 Cr20,laser spot effected region first nitride,the nitride layer is then peeled off leading edge of the rough abla- tion pattern. Gaussian distribution of the energy of the laser spot,making Ni80 Cr20 unevenly nitrided,is the main reason affecting the precision of the ablation. Laser wavefront diffraction transform technology is employed, making the spot from the Gaussian distribution of energy into energy distribution is flattened. When the laser energy is greater than 5.4 m J, the Ni80 Cr20 layer thickness 4μm uniform nitrided, then peeled, realized Ni80Cr20-Al2O3 assembly precision, with- out damage to the substrate ablation.

关 键 词：脉冲激光 激光刻蚀 复合机体 物理机制 

分 类 号：TN249[电子电信—物理电子学]