光波导端面的准分子激光刻蚀技术研究  

Research on Excimer Laser Etching Technology for Achieving Optical Waveguide End Face

作　　者：贾娜娜[1,2] 邓传鲁[1,2] 庞拂飞[1,2] 顾鑫[1,2] 王廷云[1,2] 

机构地区：[1]上海大学特种光纤与光接入网省部共建重点实验室,上海200072 [2]上海大学通信与信息工程学院,上海200072

出　　处：《中国激光》2015年第3期120-125,共6页Chinese Journal of Lasers

基　　金：上海市科学技术委员会重点科技攻关项目(13511500500);上海市教育委员会科研创新项目(14ZZ093)

摘　　要：面向光印刷互连背板的应用需求,提出基于准分子激光消融原理对光波导的刻蚀技术进行研究,在背板上任意位置获得光波导端面实现光耦合。采用193 nm波长的准分子激光作为光源,通过方形掩模孔径投影在互连背板光波导上,研究了激光能量、激光脉冲次数与刻蚀深度、端面粗糙度等参量之间关系,通过刻蚀参数的优化,刻蚀后端面光耦合损耗增加量约1.3 d B。Based on the excimer laser ablation principle, etching technique for achieving optical waveguide end face is proposed for application requirements of optical printed circuit backplane interconnect. With the laser etching technique, optical coupling end face can be fabricated at any position on optical printed circuit backplane.An excimer laser with the wavelength of 193 nm is used as the ablation light source. The laser beam is projected onto the optical waveguide for etching through a square aperture mask. The relationship among the laser energy,laser pulse times and etching depth, surface roughness has been studied experimentally. After optimizing the etching parameters, the coupling loss increase of the waveguide end face is approximate 1.3 d B after the etching process.

关 键 词：激光技术 准分子激光 光波导 激光消融 光互连 光印刷背板 

分 类 号：TN252[电子电信—物理电子学]