脉冲偏压占空比和放置状态对大颗粒分布规律的影响  

Influence of Pulsed Bias Duty Cycle and Placement State on Distribution Rule of Macroparticles

作　　者：魏永强[1,2,3] 刘建伟[1,2] 文振华[1,2] 蒋志强[1,2] 田修波[3] 

机构地区：[1]郑州航空工业管理学院机电工程学院,河南郑州450015 [2]航空制造及装备河南省高校工程技术研究中心,河南郑州450015 [3]哈尔滨工业大学先进焊接与连接国家重点实验室,黑龙江哈尔滨150001

出　　处：《热加工工艺》2015年第4期134-137,共4页Hot Working Technology

基　　金：航空科学基金资助项目(2012ZE55011);国家自然科学基金资助项目(51401182);河南省教育厅科学技术研究重点项目(13A430397和14A140026);河南省科技厅基础与前沿技术研究计划项目(132300410241);科技攻关项目(142102210504);河南省"创新型科技团队";河南省高校科技创新团队支持计划(2012IRTSTHN014)

摘　　要：利用电弧离子镀方法在201不锈钢基体上制备了Ti N薄膜,研究了脉冲偏压占空比和基体放置状态对大颗粒形貌和分布规律的影响。采用扫描电镜观察了Ti N薄膜的表面形貌,利用Image J图像软件对Ti大颗粒的数目和尺寸进行了分析。结果表明:在工艺参数相同情况下,转动时Ti N薄膜表面的大颗粒数目较多;随脉冲偏压占空比的增大,薄膜表面的大颗粒数目迅速降低,当占空比为40%时,大颗粒所占的面积比达到最小值,分别为静止时的1.9%和转动时的6.8%,为最佳的占空比值。Ti N films were deposited on 201 stainless steel substrates with different placement state and pulsed bias duty cycle by arc ion plating method, and the morphology and distribution of macroparticles（MPs） were focused on. The surface morphologies of Ti N films were observed by SEM. The amount and size of Ti MPs were analyzed by scientific image software Image J. The experimental results show that when the substrate is rotating and with the same process parameters, the amount of MPs on the Ti N film surface is lager than statics. With the increase of pulsed bias duty cycle, the amount of MPs on the film surface decreases rapidly. The duty cycle 40% is the optimum duty cycle value. The area ratio of MPs reaches a minimum：1.9% of statics and 6.8% of rotation respectively.

关 键 词：电弧离子镀 TIN 脉冲偏压 大颗粒 占空比 

分 类 号：TG174[金属学及工艺—金属表面处理]