纳米晶钨膜的沉积工艺研究及微结构表征  

Study of deposition process and microstructure characterization of the nanocrystalline tungsten films

作　　者：王玲[1,2,3] 邓爱红[1,2] 汪渊[2] 王康[3] 王一航[1] 王飞[1] 安竹[1] 

机构地区：[1]四川大学原子核科学与技术研究所辐射物理及技术教育部重点实验室,成都610064 [2]四川大学物理科学与技术学院物理系,成都610064 [3]东华理工大学核工程与地球物理学院 [4]南昌330013

出　　处：《四川大学学报（自然科学版）》2015年第2期348-352,共5页Journal of Sichuan University(Natural Science Edition)

基　　金：国家自然科学基金(11275132,51171124,50771069);四川省科技支撑计划基金(2008FZ0002);教育部新世纪人才基金(NCET-08-0380)

摘　　要：采用射频测控溅射方法,在Ar/He混合气氛下制备了纳米晶钨膜;利用增强质子背散射、慢正电子束分析和X射线衍射分析分别对钨膜中钨原子沉积情况、空位型缺陷分布及微结构进行了分析.结果表明:纳米晶钨膜具有完好的体心立方晶体结构,沿(110)方向生长;微量的氦掺入有助于钨原子沉积,同时也有利于制备均匀性和热稳定性较好的厚钨膜.Nanocrystalline tungsten films are prepared in He/Ar atmosphere by radio frequency magnetron sputtering method.The depositing condition of tungsten atoms in tungsten film,distribution of vacancy-type defects and micro-structure are characterized by enhanced proton backscattering spectrometry,slow positron beam analysis and X-ray diffraction,respectively.The experimental results show that,nanocrystalline tungsten films show well-defined body-centered cubic crystal structure with growth direction along（110）,incorporation of a small amount of He can be useful to the deposition of tungsten atoms,and also helpful to preparing thick tungsten films with well-distributed and good thermal-stability characteristics.

关 键 词：金属材料 纳米晶钨膜 磁控溅射 增强质子背散射 慢正电子束分析 

分 类 号：O779[理学—晶体学]