遗传算法设计电磁屏蔽减反膜  

Design of EMI Shielding Broadband Antireflective Coating by Genetic Algorithm

作　　者：杨尚松[1] 胡九龙[2] 洪乙又[2] 王绪丰[2] 樊卫华[2] 

机构地区：[1]中航工业太原航空仪表有限公司,太原030006 [2]中国电子科技集团第五十五研究所,南京210011

出　　处：《光电子技术》2014年第3期201-204,209,共5页Optoelectronic Technology

摘　　要：将电磁屏蔽层ITO薄膜作为一层光学薄膜,与TiO2、SiO2、MgF2一起,设计了宽带电磁屏蔽减反膜。给出了含有单层、双层、三层ITO的电磁屏蔽减反膜的膜系结构,其在可见光范围内剩余反射率均小于0.5%,满足ISO9211标准。该薄膜既具备光学减反效果,同时又具备电磁屏蔽功能,可以用作电磁屏蔽视窗。EMI shielded windows contain ITO and anti-- reflection coating in terms of G 丨 ITO 丨AR丨Air multilayer structure are designed by genetic algorithm. Single , double,and trible ITO layers contained multilayer optical coating are made respectively, which all show excellent EMI shielding performance and reflection of 0.5% , lower than traditional single ITO EMI shielded windows, meeting the standard of the ISO9211. The optimized process are also detailed herein.

关 键 词：薄膜 电磁屏蔽 减反膜 遗传算法 

分 类 号：O439[机械工程—光学工程]