部分有机物对ZHL-02碱性无氰镀银工艺的影响  

Effects of some organic compounds on ZHL-02 alkaline cyanide-free silver plating process

作　　者：高昀荞 赵健伟[1] 

机构地区：[1]南京大学化学化工学院、生命分析化学国家重点实验室,江苏南京210008

出　　处：《电镀与涂饰》2015年第7期359-364,共6页Electroplating & Finishing

摘　　要：使用光泽度仪、显微维氏硬度计、X射线粉末衍射仪以及扫描电子显微镜考察了电镀过程中常见的6种有机物（包括乙醇、苯酚、丙酮、4-羟基苯甲醛、冰乙酸和甲基磺酸）在0.5、1.5和2.5 g/L的用量下对ZHL-02无氰镀银工艺所得银镀层性能的影响。结果表明,不同有机物在不同用量和不同电流密度下对镀层晶体形貌有不同影响,导致镀层光泽度和显微硬度有不同的变化。在工作电流密度为1.0~2.0 A/dm2范围内,不同用量的有机物对银镀层的光泽度影响不大;在低电流密度（0.2 A/dm2）下,2.5 g/L的苯酚或丙酮会明显改善银镀层的光泽度;但在高电流密度（3.0 A/dm2）下,乙醇和丙酮对银镀层的光泽度有负面影响。在生产中应尽量避免引起负面效果的有机物进入镀液,而产生正面影响的有机物可以根据实际需要适量添加。The effects of six kinds of organic compounds commonly used in electroplating including ethanol, phenol, acetone, 4-hydroxybenzaldehyde, glacial acetic acid, and methanesulfonic acid with an dosage of 0.5, 1.5, or 2.5 g/L on properties of silver deposit obtained from ZHL-02 alkaline cyanide-free silver plating process were studied with gloss meter, Vickers microhardness tester, X-ray powder diffractometer, and scanning electron microscope. The result indicated that different organic compounds with different dosages have different effects on the crystalline morphology of silver deposit at different current densities, resulting in a variation of glossiness and microhardness of silver deposit. In range of working current density 1.0-2.0 A/dm2, the organic compounds with different dosages have insignificantly effect on glossiness of silver deposit. At low current density such as 0.2 A/din2, phenol and acetone with a dosage of 2.5 g/L can remarkably improve the glossiness of silver deposit. At high current density such as 3.0 A/dm2, ethanol and acetone have a negative effect on glossiness of silver deposit. The introduction of organic compounds having a negative effect should be avoided as far as possible during production, while a suitable amount of organic compounds with a positive effect can be added according to the actual need.

关 键 词：无氰镀银 有机物 光泽度 结晶形貌 显微硬度 

分 类 号：TQ153.16[化学工程—电化学工业]