基于紫外厚胶的探针加工工艺  

Probe Manufacturing Technology Based on the Thick UV Photoresist

作　　者：王伟[1,2] 张斌珍[1,2] 贾志浩[1,2] 段俊萍[1,2] 崔建利[1,2] 赵龙[1,2] 

机构地区：[1]中北大学电子测试技术重点实验室,太原030051 [2]中北大学仪器科学与动态测试教育部重点实验室,太原030051

出　　处：《微纳电子技术》2015年第4期256-260,共5页Micronanoelectronic Technology

基　　金：国家自然科学基金资助项目(61401405;51475438);山西省基础研究资助项目(2014011021-4);新世纪优秀人才支持计划资助项目(130951862)

摘　　要：研究了一种基于紫外厚胶SU-8的亚毫米探针的加工工艺,通过溶液间的界面张力形成微球,再由深紫外光刻形成微柱。这种新技术利用紫外LIGA技术替代较为复杂昂贵的深反应离子刻蚀(DRIE)技术,使用甘油补偿紫外胶与空气之间的折射率差,使紫外光透过微球后依然可以曝光厚达几百微米SU-8胶形成微柱,并且提出原位放大接触点的对准方法,实现了微球与微柱的同轴。最终实现高深宽比的探针结构,可以作为关键部件应用于三坐标测量机。由于此工艺与传感器工艺相容,探针可以直接制作在集成了传感器的测头基底上,大幅减少了装配误差。A manufacturing process of the submillimeter probe based on the thick photoresist SU-8 was studied,the microsphere was formed through the interfacial tension between the solution,and the micro-pillar was formed by the deep ultra-violet lithography.The UV-LIGA technology in the new technology was used to replace the complicated expensive deep reactive ion etching（DRIE）technology.By using the glycerol to compensate the refractivity index difference between the UV resist and air,the UV light through the microsphere can expose the thick SU-8photoresist of hundreds of micrometres to form the micro-pillar.The alignment method of the zooming contact point in situ was presented to achieve the coaxiality of the microsphere and micro-pillar.The obtained probe structure with the high aspect ratio can be used as the key component for three-coordinate measuring machine.Because the process is compatible with the sensor process,the probe can be directly fabricated on the substrate integrated with sensors,the assembly error is reduced significantly.

关 键 词：微机电系统(MEMS) SU-8胶 探针 坐标测量机 折射率补偿 

分 类 号：TH703[机械工程—仪器科学与技术]