纳米金刚石的制备及研究进展  

FABRICATION OF NANOCRYSTALLINE DIAMOND THIN FILM AND ITS DEVELOPMENT

作　　者：肖雄[1] 满卫东[1] 何莲[1] 赵彦君[1] 阳硕 

机构地区：[1]武汉工程大学湖北省等离子体化学与新材料重点实验室,武汉430073

出　　处：《真空与低温》2015年第2期63-68,77,共7页Vacuum and Cryogenics

基　　金：国家自然科学基金(NO.11175137)

摘　　要：纳米金刚石具有比普通金刚石更优越的性能,目前有诸多学者致力于纳米金刚石的研究。化学气相沉积法(CVD)制备纳米金刚石是近年来比较成熟的制备方法。通过简要描述纳米金刚石薄膜的生长机制,介绍了两种制备纳米金刚石薄膜的方法及其优势,讨论了两种方法在纳米金刚石的质量、尺寸及沉积速率等方面取得的最新研究进展,并对今后的主要研究方向进行了展望。Nanocrystalline diamond has more superior properties than normal diamond,which makes many researchers devote themselves to it. Chemical vapor deposition（CVD）is a mature method of fabrication of nanocrystalline diamond. The growth mechanism of nanocrystalline diamond thin film is explained briefly in this review. Two types of fabrication methods and their advantages are introduced. It discussed the recent development of nanocrystalline diamond in quality,scale and growth rate with these two methods and future research from different directions.

关 键 词：纳米金刚石薄膜 制备 研究进展 

分 类 号：O484[理学—固体物理] TB383[理学—物理]