基材清洗工艺对SiO_2/PET膜基结合强度的影响  

Effect of the Substrate Cleaning Process on the Adhesion Strength of SiO_2/PET Coating-Substrate System

作　　者：丁泽良[1] 林长生[1] 董运超 孙敏[1] 

机构地区：[1]湖南工业大学机械工程学院,湖南株洲412007

出　　处：《湖南工业大学学报》2015年第1期44-47,共4页Journal of Hunan University of Technology

基　　金：湖南省自然科学基金资助项目(2015JJ5019)

摘　　要：采用磁控溅射工艺,在PET表面沉积Si O2薄膜,利用SEM观察镀膜的表面形貌,通过附着力测试仪检测Si O2/PET膜基的结合强度,研究基材PET表面清洗工艺对Si O2/PET膜基结合强度的影响。结果表明:结合强度因PET基材表面清洗工艺的不同而不同,其中经等离子清洗的膜基结合强度最大,达0.14MPa,分别较深度清洗、一般清洗和不清洗的膜基结合强度高7.83%,27.27%,55.56%;等离子清洗工艺参数对膜基结合强度有较大影响,随着清洗时间的增加、氩气流量的增大和清洗功率的提高,膜基的结合强度均呈现出先增大后减小的变化趋势。The SiO2 thin film was deposited on the PET surface through magnetron sputtering technology, the coating surface morphology was observed by scanning electron microscope （SEM）, and the adhesion strength of SiO2/PET coating-substrate system was detected by adhesion strength tester. The effect of PET substrate cleaning process on the adhesion strength of SiO2/PET coating-substrate system was investigated. The results showed that the adhesion strength of coating-substrate system after plasma cleaning was maximum, up to 0.14 MPa, and increased by 7.83%, 27.27% and 55.56%comparing with that of the deep cleaning, general cleaning and no cleaning, respectively. The plasma cleaning process parameters played an important role in the adhesion strength of coating-substrate system, and the adhesion strength firstly increases and then decreases with the increase of cleaning time, cleaning power and argon flow.

关 键 词：清洗工艺 磁控溅射 SiO2/PET膜 结合强度 

分 类 号：TU411.7[建筑科学—岩土工程]