退火温度对溶胶-凝胶法制备ZnO:Al薄膜的影响  

The Influence of Annealing Temperature on ZnO:Al Thin Film Prepared by Sol-Gel Method

作　　者：郭胜利[1] 胡跃辉[1] 胡克艳[1] 陈义川[1] 刘细妹[1] 徐斌[1] 张志明[1] 

机构地区：[1]景德镇陶瓷学院机械电子工程学院,江西景德镇333403

出　　处：《陶瓷学报》2015年第2期147-151,共5页Journal of Ceramics

基　　金：国家自然基金项目(编号:61066003);江西省科技支撑计划资助项目(编号:2010BGA01100);江西省对外合作资助项目(编号:20111BDH80031;20132BDH80025);江西省自然基金资助项目(编号:20111BAB202005;20132BAB202001);江西省主要学科学术和技术带头人培养计划项目(编号:20123BCB22002);江西省高等学校科技落地计划(编号:KJLD12085);江西省教育厅科技资助项目(编号:GJJ12494;GJJ13643;GJJ13625)

摘　　要：采用溶胶-凝胶旋涂法在石英玻璃衬底上生长了ZnO:Al薄膜,对所制备的薄膜在空气中用450℃、550℃和650℃的环境中进行退火,并研究不同退火温度对薄膜样品形貌和性能的影响。用场发射扫描电子显微镜(FE-SEM)、X射线衍射仪(XRD)、紫外—可见—近红外分光光度计(UV-VIS-NIR)、荧光光谱仪(PL)多种测试手段研究了不同退火温度对ZnO:Al薄膜的结构形貌、晶格尺寸、透过率以及光致发光的影响。结果表明,该溶胶-凝胶旋涂法制备的ZnO:Al薄膜为六角纤锌矿结构,有很明显的C轴择优取向,薄膜在可见光区的透过率超过90%。随着退火温度的升高,薄膜(002)衍射峰增强,薄膜的晶粒尺寸增大,薄膜的光致发(PL)光强度增强且紫外发光边带随着退火温度的增加向短波方向移动。The ZnO：Al thin films were deposited on the quartz glass substrates by sol-gel spray-spin coating technique. Then the three thin films were annealed in air at 450 ℃, 550 ℃ and 650 ℃, respectively. The influence of annealing temperatures on the morphology, grain size, transmission spectrum and PL of the films were detected by scanning electron microscopy, X-ray diffraction （XRD）, UV-Vis spectrophotometer and photoluminescence spectroscopy respectively. The results showed that the films had hexagonal wurtzite-structured grains, exhibited C-axis preferred orientation and the average transmittance were found to be over 90% in the visible region. As the annealing temperature increased, the （002） peaks strengthened, the grain sizes became bigger, the PL intensity increased and the band of ultraviolet emission shifted to short wavelength.

关 键 词：ZNO薄膜 溶胶-凝胶法 退火温度 光学性能 

分 类 号：TQ174.75[化学工程—陶瓷工业]