用于光学位移传感器的新型数字编码光栅尺的制作(英文)  

Fabrication Process of a Novel Digital Encoding Grating Ruler for Optical Displacement Sensors

作　　者：王宇[1] 陈火耀[1] 刘正坤[1] 郑衍畅 洪义麟[1] 付绍军[1] 

机构地区：[1]中国科学技术大学国家同步辐射实验室,合肥230029

出　　处：《光子学报》2015年第4期166-170,共5页Acta Photonica Sinica

基　　金：The Technology Innovation Fund for Aviation Industry Corporation of China(No.2009D61864);the National Science Foundation for Young Scientists of China(No.11105145)

摘　　要：介绍了数字编码光栅尺的结构设计并提出一种制作方法.采用紫外对准光刻、全息光刻及湿法腐蚀结合在（100）硅片上制作母光栅尺,并以具有紫外固化特性的聚氨酯丙烯酸酯为材料,将母光栅尺复制到硬基底上.实验表明,该工艺可重复性高,复制光栅尺的衍射效率高于母光栅尺的90%,并能承受航空环境-55℃~70℃的高低温冲击.光栅尺的制作准确度满足传感器的要求,信号响应准确率100%.该方法可对具有准确度高、图形复杂、工作环境恶劣等特点的微纳米结构的制作提供借鉴.The structure and fabrication process of a novel Digital Encoding Grating Ruler（DEGR）were introduced.In this process,the pattern of DEGR is firstly fabricated on a（100）silicon wafer by combining UV lithography and holography lithography with wet etch technique,and then replicated to a hard substrate using polyurethane acrylate which is UV curable.Experimental results show that the process is highly repeatable.The replicated gratings work properly in the ambient temperature ranging from-55℃to 70℃,and its diffraction efficiency is higher than 90% of the master one.The fabrication precision meets the requirements of the optical sensor,and the signal response accuracy is 100%.Moreover,this process could be used to fabricate other micro-nanometer structures with high precision,complex pattern and poor working environment.

关 键 词：光学位移传感器 编码光栅 复制技术 紫外光刻 全息光刻 光传操纵系统 

分 类 号：O436[机械工程—光学工程] TH162[理学—光学]