In-Situ Rs and Improvement in Thermal Stability of Nickel Silicides Using Different Interlayer Films  

作　　者：Chi-Ting Wu Wen-Hsi Lee Ying-Lang Wang Shih-Chieh Chang 

机构地区：[1]Department of Electrical Engineering, National Cheng Kung University, Tainan 701, Taiwan. [2]Institute of Lighting and Energy Photonics, National Chiao Tung University, Hsinchu 30050, Taiwan

出　　处：《材料科学与工程（中英文A版）》2015年第3期164-170,共7页Journal of Materials Science and Engineering A

关 键 词：高热稳定性 硅化镍 原位 镍硅化物 膜 腐蚀速率 NISI 电阻率 

分 类 号：TN304[电子电信—物理电子学] TS106.62[轻工技术与工程—纺织工程]