激光沉积大面积均匀薄膜数学模型与实验  

Mathematical model and experiment for preparing uniform film by PLD on large surface

作　　者：陆益敏[1] 王淑云[1] 郭延龙[1] 黄国俊[1] 程勇[1] 田方涛[1] 

机构地区：[1]武汉军械士官学校光电技术研究所,武汉430075

出　　处：《强激光与粒子束》2015年第7期41-45,共5页High Power Laser and Particle Beams

摘　　要：由于激光烧蚀靶材产生的等离子体呈高斯分布,其中所包含粒子密度及性能的空间分布极不均匀,因此脉冲激光沉积法难以制备性能与膜厚均匀的大面积薄膜。提出并构建了衬底自转与一维变速平移机构,衬底匀速自转的同时,进行一维平移,越靠近等离子体中心平移速率越大、反之越小,达到均匀镀膜的目的;在此基础上建立了机构运动参数对膜厚影响的数学模型,通过仿真模拟分析关键参数对膜厚分布的影响;通过运动参数优化指导实验,最终获得了直径为200mm、不均匀性不超过±4%的大面积类金刚石膜,与仿真优化结果吻合。Because plasma generated through laser ablation takes on a Gaussian form, dimensional distribution of quantity and kinetic energy of particles are terribly uneven, it＇s difficult to prepare large area films with uniform thickness and performance by pulse laser deposition. In our study, a translation device was designed, the shifting velocity of the rotational substrate in creased gradually while approaching the center of plasma, whereas decreased gradually while departing in order to obtain a uni form film. The math model of influence of motion parameters on thickness of the film was founded. Finally, through simulation and optimization, the uniform diamond like carbon film with diameter of 200 mm and thickness variation below ±4% was pre pared by pulse laser deposition.

关 键 词：脉冲激光沉积 大面积平面 均匀薄膜 类金刚石膜 

分 类 号：O484.1[理学—固体物理]